| 摘要 |
PURPOSE:To achieve the sufficient agitation effect of developer in case of transferring a spinner to normal or reverse revolution making the development even by a method wherein the developer is dripped on a photoresist while the spinner is being turned in the normal or reverse direction. CONSTITUTION:Developer is dripped from a developer nozzle 3 while a spinner 1 is being turned at relatively high speed in the normal direction. The developer can be spread by centrifugal force in the radial direction on a wafer W by means of accelerating the turning speed by controlling a motor 2 at a revolution controller 5. When the revolution reaches the specified revolution range of 30-100 rpm, the motor 2 is controlled by a revolving direction controller 6 to turn the spinner 1 in the reverse direction. When the spinner 1 reaches the specified revolution in the reverse direction, the revolving direction is transferred to turn the spinner 1 in the normal direction. Through these procedures, the developer can be suffieicntly agitated in the circumferential direction by the normal or reverse revolution of wafer W to stop the laminar flow in the circumferential direction so that the development may be made even. |
