发明名称 ION IMPLANTING APPARATUS
摘要 PURPOSE:To obtain a clean vacuum without contaminating a container to evacuate by an oil vapor for a long time, by furnishing rotary baffles which consist of rotors rotating respectively, at the suction pipe side of a vacuum evacuation rotary pump at each part of an ion implanting apparatus. CONSTITUTION:Rotors 12 of each of rotary baffles 9a to 9d are rotated in a casing 13, and the spaces formed between the rotors 12 and the casing 13, or between the rotors 12 are transferred from the side of a container to evacuate to the side of rotary oil pumps 8a and 8b. And the exhaust passages through which the gas and the like in the container to evacuate are exhausted are secured by passing through the said spaces, and these exhaust passages are composed to shield perfectly optically by the rotors 12. Therefore, the oil vapor is attached to the rotors 12 and prevented from flowing back to the container to evacuate, and a clean vacuum can be obtained.
申请公布号 JPS63128542(A) 申请公布日期 1988.06.01
申请号 JP19860274052 申请日期 1986.11.19
申请人 HITACHI LTD 发明人 YAMAZAKI TAKASHI;ANDO HIROSHI
分类号 H01L21/265;H01J37/317 主分类号 H01L21/265
代理机构 代理人
主权项
地址