发明名称 SEMICONDUCTOR SUBSTRATE WASHER
摘要 PURPOSE:To substitute water sufficiently for chemical components staying on the bottom of a washing bath by providing a washing bath with a bottom plate which has fine holes over its whole plane. CONSTITUTION:A plurality of fine holes 4a, 4a of the identical diameter are provided over the whole plane of the bottom plate 4 of a washing bath 1 and the bottom plate 4 is placed in the washing bath 1 so as to leave a space of a drainage box 5 between the bottom plate 4 and the bottom of the washing bath 1. As the bottom plate 4 which has the fine holes 4a is provided before the drainage box 5, water in the washing bath 1 is drained uniformly by the fine holes 4a of the bottom plate 4. With this constitution, even if the quantity of the drained water is little, the water is substituted for chemical components efficiently so that the washing effect can be improved.
申请公布号 JPS63128633(A) 申请公布日期 1988.06.01
申请号 JP19860274280 申请日期 1986.11.18
申请人 NEC KYUSHU LTD 发明人 NONAKA HIROSHI
分类号 H01L21/304;B08B3/04 主分类号 H01L21/304
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