摘要 |
Photosensitive polymers and their process of preparation which can be crosslinked by a vinyl polymerization initiated by photochemical means and which are derived from the reaction of polymers containing zerewitinoff-active hydrogen atoms with N-methylol compounds or with N-Methylol ethers of acrylamides or substituted acrylamides. The modified polymers optionally in admixture with other vinyl group containing monomers are useful for purposes such as photosensitive copying layers, coatings and molded articles. |