| 摘要 |
PURPOSE:To form an alignment pattern between the orientation flat line and the photomask of a substrate in a desired azimuth of the substrate with resulting high accuracy, by connecting the two apexes of two confronting polygons. CONSTITUTION:The alignment of the photomask 1 and a substrate orientation flat line 3 is performed. And as the alignment pattern on the photomask 1, the two apexes of the two confronting polygons are connected. By confronting the apexes of the two polygons keeping contact with each other, a point is generated at a position where they are brought into contact with each other. By connecting those two apexes, the point is extended linearly. Therefore, it is possible to perform the alignment with the orientation flat line 3 of the substrate with resulting high accuracy, setting the point as a mark. |
