发明名称 TREATING DEVICE FOR WASTE DEVELOPING SOLUTION
摘要 PURPOSE:To simplify construction and to permit easy use of a device in a small-scale photofinishing laboratory such as minilaboratory by using a floating heater which contains a heater and is so formed as to float on the surface of a waste developing soln. to heat the waste soln. in a vessel from the liquid surface. CONSTITUTION:A fan 18 is run and the floating heater 20 is energized at the time of treating the waste soln. Air flows along the outside circumference of a cooling fin 14 to execute force cooling when the fan 18 runs. The heater 22 generates heat and heats the waste developing soln. 12 from the liquid surface without boiling the soln. 12 when the floating heater 20 is energized. The moisture contained in the soln. 12 evaporates when the waste soln. is heated and, therefore, the concentration of the soln. 12 progresses and the heater 20 descends gradually according to the liquid level. An operator opens a door, takes out the vessel 13 and removes the concd. or solidified matter when the soln 12 is concentrated or solidified. The moisture evaporating from the soln. 12 condenses on the inside of the force-cooled cooling fin 14 and flows down along the inside wall. The water is collected in a groove 19 formed to the peripheral part of a base 11.
申请公布号 JPS63128344(A) 申请公布日期 1988.05.31
申请号 JP19860274936 申请日期 1986.11.18
申请人 FUJI PHOTO FILM CO LTD 发明人 IWANO HARUHIKO;KAMINAKA KAZUSHIGE
分类号 G03D15/00;B01D1/00;G03D3/00 主分类号 G03D15/00
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