发明名称 VACUUM TREATMENT DEVICE
摘要 PURPOSE:To permit the required treatment only to the narrow local points of objects to be treated by providing means for injecting energy to molecular flow of a high concn. locally generated in a vacuum and converting the same to plasma. CONSTITUTION:The gas introduced through a gas introducing port 2 into a high vacuum in the direction of, for example, an arrow 11 and pass through the entire stage of a central hole 6 turns to the molecular flow of a high density flying in a uniform direction like an arrow 13. The energy generated by the high-frequency electric power impressed to a coil 8 is injected to the high-density molecular flow to form the plasma thereof. Vacuum treatments such as production of powder and surface treatment of substrates are executed by using the resultant products of charge particles, active species, radiated light, etc., generated by such plasma formation.
申请公布号 JPS63125684(A) 申请公布日期 1988.05.28
申请号 JP19860271290 申请日期 1986.11.14
申请人 ANELVA CORP 发明人 SAKAI SUMIO
分类号 B01J19/08;B22F9/14;C23C8/36;C23C16/48;C23C16/50;C23F4/00;C30B25/14;H01L21/203;H01L21/205;H05H1/24;H05H3/02 主分类号 B01J19/08
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