| 摘要 |
PURPOSE:To generate a large beam current by the use of a low acceleration voltage by generating ions by discharge under an atmosphere of diluted gaseous ions and drawing these ions by a specific grid. CONSTITUTION:When a cathode 6 of an ion source 1 is heated by a cathode source 14 and when a required voltage is applied to an anode 7, discharge occurs in a diluted gas between the cathode 6 and the anode 7, so that positive and negative ions of the gas are generated to form plasma. Positive ions in the plasma are accelerated by an ion drawing electrode 11 serving as a grid and drawn into a sputtering chamber 2. The electrode 11 is formed of a sheet of a metallic thin plate, for example, which is made of stainless steel of 0.1 mm or so in plate thickness and equipped with a large number of small holes of 0.2 mm to 0.4 mm in diameter so that the porosity becomes 70 % to 80 %. Thus, a high beam current of 100 mA or more can be obtained with a comparatively low acceleration voltage of 200 V or so and this current is used effectively for a sputtering device or the like.
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