发明名称 EXPOSURE METHOD FOR SHADOW MASK FOR COLOR CATHODE-RAY TUBE
摘要 PURPOSE:To enable close adhesion of resin films to negative plates in short time and to remove local adhesion faults by selectively removing emulsion layers on the negative plates and forming vacuum absorption grooves and making these negative plates closely adhere to sensitive resin films. CONSTITUTION:Parts of emulsion layers 2 on negative plates 3a and 3b are selectively removed without hindrance on the negative patterns so that vacuum absorption grooves 10 are formed. Air between sensitive resin films 7 and the emulsion layers 2, both of which are closely formed on a metallic plate 6, can be absorbed and removed through these vacuum absorption grooves. Hence, close adhesion of the sensitive resin films 7 to the negative plates 3a, 3b can be performed in a short time and adhesion faults due to remaining air can be removed.
申请公布号 JPS63124329(A) 申请公布日期 1988.05.27
申请号 JP19860267815 申请日期 1986.11.12
申请人 TOSHIBA CORP 发明人 KITA NOBUO
分类号 H01J9/14;H01J29/07 主分类号 H01J9/14
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