发明名称 |
COLOR FILTER AND ITS PRODUCTION |
摘要 |
<p>PURPOSE:To permit formation of fine patterns with a simple process for production by forming a resist layer which has the sensitivity higher than the sensitivity of a colored resin and does not dissolve in a developing soln. for the colored resin on a colored resin layer which is formed to a pattern shape. CONSTITUTION:The colored resin film 2 is coated to a required film thickness on a substrate 1 by using a polyamide resin soln. contg. a prescribed ratio of a coloring material having desired spectral characteristics and is baked. The similar polyamide resin soln. is then coated on the film 2 and is baked to form a transparent resist film 7. The film 7 is exposed through a photomask 3 having a prescribed pattern shape at a required exposure by light (high- pressure mercury lamp, etc.) having the sensitivity of the resist film to photoset 7a the pattern part. The film 7 is then ultrasonically developed by a solvent which dissolves only the unexposed part and colored resin to form the pattern leaving only the resist pattern film and the resin film 2 thereunder. The photosetting of the patterned part of the colored resin is then executed by full surface exposing and the resin layer is baked by which the patterned colored resin layer 4 having the resist layer 7b thereon is obtd.</p> |
申请公布号 |
JPS63124002(A) |
申请公布日期 |
1988.05.27 |
申请号 |
JP19860271260 |
申请日期 |
1986.11.13 |
申请人 |
CANON INC |
发明人 |
TAKAO HIDEAKI;TAMURA MIKI;KAMIO MASARU;MURATA TATSUO;SEKIMURA NOBUYUKI;TAKAHASHI TORU |
分类号 |
H01L27/14;G02B5/20;G02F1/133;G02F1/1335;H04N9/07 |
主分类号 |
H01L27/14 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|