| 摘要 |
<p>PURPOSE:To shield light over the entire region of unnecessary parts with just one time of photolithographic stage by using an opaque conductive film as a light shielding film, anodizing said film and using the anodized film as a photomask. CONSTITUTION:The opaque conductive film 2 is formed on a transparent insulating substrate 1 and after a photoresist is coated thereon, the resist is left to the desired pattern shape of the light shielding film and the unnecessary conductive film 2 parts are removed; thereafter, the resist is stripped. The substrate 1 is immersed in a sulfuric acid soln. and anodic oxidation is executed with the substrate 1 as an anode, by which the anodized insulating film 3 is formed on the conductive film 2. The transparent conductive film 4 is formed after the substrate 1 is cleaned. A negative type photoresist 5 is then coated and is exposed and developed from the rear side of the substrate 1. The unnecessary parts of the conductive film 4 are removed with the selectively left resist 5 as a mask. Electricity is thereafter fed to the parts where the desired conductive film 4 remains by an electrodeposition method to form an electrodeposition layer 5' having a desired color and thickness on the film 4. The desired color filter is thus obtd.</p> |
