发明名称 AUTOMATIC PROCESSOR OF CHEMICAL FOR SUBSTRATE
摘要 <p>PURPOSE:To provide a device for diffusing chemical to the whole surface to be processed by surface tension and automatically processing with the chemical by supplying the chemical on a belt conveyor made of an anticorrosion material, and so placing the surface to be processed by a wafer as to steadily contact it therewith. CONSTITUTION:A belt conveyor 2 surface-treated with Teflon to be used with aqueous solution of medicine 6 mixed with nitric acid and fluoric acid is provided as chemical for processing a wafer, and a buret unit 3 for supplying the chemical 6 is mounted at the upstream. A placing device 5 for placing a wafer 1 is disposed in one section 2a on the conveyor 2. When the dropped chemical 6 arrives under the wafer 1, the wafer 1 is steadily moved down by a controller 7 to be placed on the conveyor 2 while slightly collapsing the upper surface of the semispherical chemical 6. Accordingly, the chemical 6 is extended on the whole surface to be treated of the wafer 1. A unit device 4 is opposed to the exhaust end of the conveyor 2, and the wafer 1 processed with the chemical is placed on arm rods 4a, 4b by sliding.</p>
申请公布号 JPS63122126(A) 申请公布日期 1988.05.26
申请号 JP19860268140 申请日期 1986.11.11
申请人 NAMBU ELECTRIC CO LTD 发明人 SAKA YOSHITAKA
分类号 H01L21/304;H01L21/677;H01L21/68 主分类号 H01L21/304
代理机构 代理人
主权项
地址