发明名称 METHOD FOR COATING YTTRIA-STABILIZED ZIRCONIA FILM
摘要 PURPOSE:To execute coating of a Y2O3-stabilized ZrO2 film having airtightness by executing plasma discharge under specific conditions by using an org. zirconium compd., org. yttrium compd. as well as gaseous CO2, H2 and Ar or N2. CONSTITUTION:The Y2O3-stabilized ZrO2 film is coated on a material to be treated by utilizing the org. zirconium compd. org. yttrium compd. as well as the gaseous CO2, H2 and Ar or N2 and executing the plasma discharge. Zirconium acetyl aceton, etc., are used as the org. zirconium compd. and yttrium acetate, etc., are used as the org. yttrium compd. in the above-mentioned method and these compds. are so adjusted that the mixing ratio of Zr/Y attains 5.75-3.66atom ratio. While the material to be heated is heated to 100-400 deg.C, the material is subjected to the plasma discharge under 50-500W load electric power in the atmosphere kept under 0.1-2.0Torr. The film having airtightness in the state of a thin film is thereby obtd.
申请公布号 JPS63121647(A) 申请公布日期 1988.05.25
申请号 JP19860267679 申请日期 1986.11.12
申请人 MITSUBISHI HEAVY IND LTD;SEIRYO ENG CO LTD 发明人 NAKAMORI MASAHARU;SAKAI HIROSHI;TAKAHAMA MASAFUSA
分类号 C23C4/04;C23C4/12;H01M8/12 主分类号 C23C4/04
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