发明名称 SPUTTER ION PUMP FOR ACCELERATOR
摘要 PURPOSE:To decrease the current in a cathode plate and reduce the irregular magnetic field by providing slits in the cathode of a sputter ion pump. CONSTITUTION:This is a sputter ion pump for an accelerator provided with multiple cylindrical anode cells installed in the vacuum container of the deflecting electromagnet section of the accelerator and cathode plates having slits and installed on both wides of these anode cells. The slits 11 are provided at a narrow distance in this titanium cathode 8a not to reduce the strength of the titanium cathode 8a, the passage of the eddy current is cut off by these slits 11, the eddy current can be almost eliminated, and the irregular magnetic field can be reduced.
申请公布号 JPS63121242(A) 申请公布日期 1988.05.25
申请号 JP19860265441 申请日期 1986.11.10
申请人 TOSHIBA CORP 发明人 TANABE YOSHIO
分类号 H05H7/00;H01J41/12;H05H13/04 主分类号 H05H7/00
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