Method for microfabrication of pattern on substrate using X-ray sensitive resist

摘要

A method for microfabrication of a pattern on a substrate in accordance with the present invention comprises steps of; forming a thin film of X-ray sensitive resist of chlorinated polymethylstyrene on the substrate, wherein the chlorinated polymethylstyrene has an average molecular weight of 400,000-700,000 and a chlorine content of 20-40 wt. % and contains fundamental monomer structure of where at least one of the atom sites alpha , beta and gamma is occupied by chlorine instead of hydrogen; selectively exposing the film to Pdl alpha radiation; developing the exposed film with ethoxyethanol and/or methoxyethanol.