| 摘要 |
PURPOSE:To obtain a semiconductor producing apparatus which can make temperature distribution within a furnace uniform and can decrease delay in recovery of temperature characteristics in the furnace, by providing three or more boat supporting hooks with equal spaces on the inner wall of a core tube, and forming notches in a lower plate of a wafer boat so as to allow the boat supporting hooks to pass through the notches. CONSTITUTION:In a semiconductor producing apparatus including a vertical electric furnace adapted to perform oxidation, diffusion, CVD or the like for wafers by receiving a wafer boat 10 on which wafers are carried within a core tube 1, at least three boat supporting hooks 9 are arranged in the same plane with equal spaces on the inner wall of the core tube 1. Further, a lower plate 12 of the wafer boat 10 on which wafers are carried is provided with notches 13 so that the boat supporting hooks 9 pass through the notches. Thus, when the wafer boat 10 is disposed on a boat support 14 and rotated by a predetermined angle, the lower plate 12 can be supported on the boat supporting hooks 9. Accordingly, since the boat support is not present within the core tube, temperature distribution within the furnace can be made uniform and the delay in recovery of temperature characteristics in the furnace can be decreased. |
