发明名称 PHOTO-SETTING RESIN COMPOSITION
摘要 PURPOSE:To provide a composition having excellent chemical resistance, water- resistance and mechanical strength, etc., and composed of a side-chain unsaturated resin having (meth)acryloyl group on side chain terminal through a skeleton structure of epoxy resin, a (meth)acrylate monomer and a photo-polymerization initiator. CONSTITUTION:The objective photo-setting resin composition is composed of (A) a side-chain unsaturated resin of formula [A is main chain composed of a copolymer resin of a vinyl monomer and a (meth)acryloyl group; R is H or CH3; Y is an epoxy resin residue obtained by forming an ester bond by ring-opening addition reaction of an epoxy group in the molecule with carboxyl group and removing said ester bond from the reaction product], (B) a monomer having one or more (meth)acryloyl groups in one molecule (e.g. phenoxyethyl acrylate) and (C) >=0.1% photo-polymerization initiator (e.g. benzophenone). The composition is useful in the field of paint, adhesive, cast product and FRP.
申请公布号 JPS63118304(A) 申请公布日期 1988.05.23
申请号 JP19860264061 申请日期 1986.11.07
申请人 SHOWA HIGHPOLYMER CO LTD 发明人 TAKIYAMA EIICHIRO;MORITA KATSUHISA
分类号 C08F2/48;C08F20/00;C08F20/10;C08F290/00;C08F299/00;C08F299/02 主分类号 C08F2/48
代理机构 代理人
主权项
地址