发明名称 CORRECTING METHOD OF DEFLECTION STRAIN OF ELECTRON-BEAM LITHOGRAPHY
摘要 PURPOSE:To minimize connection errors among a plurality of deflection regions when the deflection regions are connected mutually by making much account of the quantity of deflection strain at a spot of maximum quantity of deflection in the deflection regions and weighting the quantity of deflection strain at the spot and correcting deflection strain when a deflection-strain correction factor is to be calculated. CONSTITUTION:First correction factors a1-a10 and b1-b10 are obtained through the same method as a conventional method, each measuring point is given weighted coefficients n(i, j), and S, Sx' and Sy' represented by formula are acquired by using the weighted coefficients. A normal equation is prepared by employing these relation- ship, a novel correction factor is obtained by solving the equation, these correction factors are set to a correction arithmetic circuit 3, and lithographing is executed. When the weighted coefficient at the time of i=1, i=NX, j=1 or j=NY is represented by 10 and weighted coefficients at other spots by 1 in n(i, j), the result of correction takes a shape that the quantity of strain at the maximum spot of deflection of deflection regions is minimized, thus reducing connection errors of patterns connected among the deflection regions.
申请公布号 JPS63119235(A) 申请公布日期 1988.05.23
申请号 JP19860263791 申请日期 1986.11.07
申请人 HITACHI LTD 发明人 SASAKI MINORU
分类号 H01J37/147;H01L21/027;H01L21/30 主分类号 H01J37/147
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