| 摘要 |
PURPOSE:To enable evaporated particles to reach the surface of a base place at a prescribed mixing ratio by providing a means wherein electron beams projected from one electron gun are periodically applied at a proper time to the proper positions in plural housing bodies of evaporation materials. CONSTITUTION:Each electric power is set according to a mixing ratio of evaporation materials housed in a first, second and third crucibles 4A, 4B and 4C. Each set electric power is added and fed to an electric power source 7 for heating a filament. On the other hand, a continuous irradiation position signals in the X and Y directions are formed from both time when evaporation materials A, B and C are irradiated in one cycle and irradiation position singles, etc., and fed to an X-directional electromagnetic coil 9X and a Y-directional electromagnetic coil 9Y. Electron beams are generated from an electron gun 5 heated with the electric power source 7. These beams are accelerated with an acceleration electrode 6 and applied to the prescribed position of the evaporation materials A-C housed in respective crucibles 4A-4C for prescribed time. Thereby the evaporated amounts of materials A-C are made to a specified ratio. In case of repeating this irradiation at a proper cycle, a film having prescribed thickness and the prescribed mixing ratio is formed on the surface of a base plate 2.
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