| 发明名称 |
PRODUCTION OF SEMICONDUCTOR DEVICE |
| 摘要 |
PURPOSE:To obtain photoetching of sharply cut picture lines by performing development with an aqueous trialkyl (hydroxyl alkyl) ammonium hydroxide solution in exposing, developing and removing a positive type photosensitive resin, and also using this chemical in removing the unexposed resin. |
| 申请公布号 |
JPS5264877(A) |
申请公布日期 |
1977.05.28 |
| 申请号 |
JP19750140721 |
申请日期 |
1975.11.26 |
| 申请人 |
TOKYO SHIBAURA ELECTRIC CO |
发明人 |
MURAOKA HISASHI;ASANO MASAFUMI;OOHASHI TAIZOU;SHIMAZAKI YUUZOU |
| 分类号 |
H01L21/30;G03F7/30;G03F7/32;H01L21/027;H01L21/302 |
主分类号 |
H01L21/30 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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