发明名称 SUBSTRATE HEATER
摘要 PURPOSE:To reconcile high temperature near the melting point of a substrate with thermal uniformity by the presence of a flat plate for alleviating temperature irregularity and individual operation of mutually auxiliary operations of two electrothermal units disposed at both sides of the flat plate. CONSTITUTION:In a substrate heater, an outer shell is formed of a platelike substrate holding frame 2 for setting a substrate 1 and a coverlike body outer frame 4 detachably attached through an engaging member 3 to the side of the frame 2. An arbitrary number of reflecting plates 5 are disposed in multiplex inside the frame 4, two flat plates 7, 9 are opposed by a post and spacer 6 to the same surface of the substrate 1 inward of the plates 5, and attached substantially in parallel with the substrate at the positions at different distances from the substrate 1. The flat plate disposed near the substrate 1 is used as the plate 9, a first electrothermal unit 8 is attached to the front surface of the plate 9 at the side of the substrate, and the flat plate disposed further from the substrate 1 is used as the insulting flat plate 7, and a second electrothermal unit 10 is attached to the front surface of the plate 7 at the side of the substrate.
申请公布号 JPS63116419(A) 申请公布日期 1988.05.20
申请号 JP19860261828 申请日期 1986.11.05
申请人 NEC CORP 发明人 TOYAMA SHIGERU
分类号 H01L21/285;H01L21/203 主分类号 H01L21/285
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