发明名称 MASQUE D'EXPOSITION POUR RAYONNEMENTS MULTIPLES
摘要 A pattern exposure mask comprising a support (1, 2) provided with a plurality of patterning films (3 and 4, 5) which respectively have different absorptive or stopping power with respect to different electro- magnetic or quantum rays (6, 7) (e.g. light, X-rays electron beams) such that each patterning film (3 and 4, 5) has such power only with respect to certain of said rays. <IMAGE>
申请公布号 FR2494865(B1) 申请公布日期 1988.05.20
申请号 FR19810021578 申请日期 1981.11.18
申请人 SUWA SEIKOSHA KK 发明人 SEIICHI IWAMATSU
分类号 H01L21/027;G03F7/20;H01L21/30 主分类号 H01L21/027
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