| 摘要 |
PURPOSE:To obtain a membrane for an X-ray mask in which a remaining stress can be easily controlled and which has excellent transmissibility of a visible light for positioning by controlling the composition of a thin B-Si-N compound film. CONSTITUTION:A membrane is composed of compounds including three types of B, Si and N, with Si content being 15at% or more and less than 100at%, and Si/(B+Si) atomic ratio is 0.2 or more and less than 1 (0.25 or more by Si/B atomic ratio). In a method for synthesizing the membrane in a vapor phase, it is precipitated on a substrate under the condition that the atomic ratio of N to B, Si contained in supply material vapor is 1 or more. Thus, since a remaining stress can be controlled without a composition containing insufficient nitrogen as compared with stoichiometrical ratio, an X-ray mask having excellent transmissibility for a visible light can be formed. |
