发明名称 FORMATION OF FLATTENED LAYER IN RESIST HAVING TWO-LAYERED STRUCTURE
摘要 PURPOSE:To eliminate mis-alignment of patterns by accumulation of electric charge and to permit formation of the patterns with high accuracy by adding a photosensitive agent and binder to polyvinyl carbazole (PVCz) and curing the mixture by UV light. CONSTITUTION:A flattening material prepd. by adding the photosensitive agent and binder to the PVCz is used in the process for forming the resist having the two-layered structure by electron rays. Said material is cured by the UV light. The PVCz having about 100,000-1,500,000mol.wt. is preferably used and is dissolved together with the photosensitive agent and binder into a suitable solvent, for example, a liquid mixture composed of monochlorobenzene/O- dichlorobenzene to prepare a coating soln. Such soln. is coated by a casting method, more preferably spin coating method. The useful photosensitive agent is an azide compd. which is soluble in the solvent for the PVCz. The mis- alignment of the patterns is thereby decreased.
申请公布号 JPS63113445(A) 申请公布日期 1988.05.18
申请号 JP19860256751 申请日期 1986.10.30
申请人 FUJITSU LTD 发明人 KAWASAKI YOKO;SAITO KAZUMASA;FUKUYAMA SHUNICHI;SHIBA SHOJI;WATABE KEIJI
分类号 G03F7/038;G03F7/095 主分类号 G03F7/038
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