| 摘要 |
PURPOSE:To form a uniform thin film of a resist by means of a simple and inexpensive wet coating method by incorporating a specific crystalline condensed tungstic acid to the titled material. CONSTITUTION:The inorg. resist thin film contg. the crystalline condensed tungstic acid contg. peroxo (O2<2->) atom, or said acid contg. the peroxo atom and a carbon atom as a hetero atom is used for the titled material. Said crystalline condensed tungstic acid is the crystalline condensed tungstic acid shown by the formula WO3.xCO2.yH2O2.zH2O wherein X is 0<=(x)<=0.25, (y) is 0.95<=(y)<=1.1, (z) is 1.0<=(z)<=1.2. In order that the condensed tungstic acid is a crystalline and displays positive type characteristics, the interrelation-ship shown by the formula 0.95<=(y)<=1.1 is necessary to be satisfied. Thus, the uniform thin film of the titled material is formed by means of the simple and cheap wet coating method. |
