| 摘要 |
<p>PURPOSE:To eliminate the need for a cover pattern and to simplify data for pattern formation by setting the arrangement position of an auxiliary pattern on the inside of step-and-repeat exposure while it is along the outside of a block. CONSTITUTION:A reticle used as a mask for step-and-repeat exposure is constituted by arranging plural blocks 1 of a pattern occupying a product area adjacently to each other and arranging auxiliary patterns 2 used auxiliary for the product manufacture between the blocks. Therefore, a cover pattern provided so as to prevent the exposure of the auxiliary patterns 2 from becoming ineffective at the time of step-and-repeat exposure is omitted. Consequently, the data for the pattern formation of the reticle is simplified.</p> |
