发明名称 MICROWAVE ION SOURCE
摘要 PURPOSE:To improve the efficiency of polyvalent ion generation by providing multiple solenoid coils or permanent magnets different from a main solenoid coil, near the outer wall of a plasma chamber. CONSTITUTION:A plasma chamber is fed with microwaves and generates the plasma of the sample gas, and a solenoid coil 1 generates the magnetic field in the plasma chamber. An ion beam from the plasma chamber is extracted by an extracting electrode system 5. Magnet trains 6 made of permanent magnets are arranged in four columns in the circumferential direction near the outer wall of the plasma chamber. The magnet trains 6 generate the circumferential magnetic field, and its magnetic field strength is weakest at the center portion of the plasma chamber and becomes larger toward the tube wall. Accordingly, the plasma grain loss for the wall is suppressed, and the polyvalent ion generation efficiency in the plasma chamber can be improved.
申请公布号 JPS63114032(A) 申请公布日期 1988.05.18
申请号 JP19860258206 申请日期 1986.10.31
申请人 HITACHI LTD 发明人 TOKIKUCHI KATSUMI;SAKUMICHI KUNIYUKI;KOIKE HIDEMI;SEKI TAKAYOSHI;OKADA OSAMI
分类号 H01J27/16;H01J37/08 主分类号 H01J27/16
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