Alkali-soluble siloxane polymer, silmethylene polymer, and polyorganosilsesquioxane polymer

摘要

There are provided an alkali-soluble siloxane polymer, an alkali-soluble silmethylene polymer, and an alkali-soluble polyorganosilsesquioxane polymer. They are useful as a photoresist for the fabrication of semiconductor devices. They are suitable for dry etching because of their superior resistance to oxygen plasmas.