发明名称 TRANSFER MASK
摘要 PURPOSE:To make it possible to previously prevent the trouble resulting from separation of an attched exposure mask from a substrate in the tightly attached exposure mask for forming an electronic element by providing a special hole in the effective region of projection. CONSTITUTION:In the conformable mask and X-ray exposure mask, a transfer pattern region per pellet surrounded by support reinforcing mount disposed in the form of lattice is sacrificed to form a hole through which gas easily penetrates its back and front sides. In the hard mask, too, a portion of the region which separates each transfer pattern region of each pellet arranged many ones is made the similar hole as above. Accordingly, such a phenomenon as the absorption of the transfer madk to the substrate hardly separated from each other can be prevented. Further, the accuracy of positioning the mask is exceedingly enhanced, and the working time reguired therefor is considerably reduced. Besides, the transfer mask itself can be easily handled.
申请公布号 JPS5465533(A) 申请公布日期 1979.05.26
申请号 JP19770132340 申请日期 1977.11.02
申请人 NIPPON ELECTRIC CO 发明人 TAJIMA MASAO
分类号 G03C5/08;G03F1/60;G03F7/004;G03F9/00;H01L21/027;H01L21/302 主分类号 G03C5/08
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