发明名称 PLASMA PROCESSING POWER SOURCE MONITOR
摘要 PURPOSE:To enable abnormal discharge to be grasped automatically and quantitatively, by memorizing/computing data on changes in amplitude of electrode voltage. CONSTITUTION:High frequency power is applied to a point A of an upper electrode 104a in a plasma processor 1. When abnormal discharge occurs, a detector 2 detects this abnormal voltage on the point A and gives a signal B to a differentiator 3. The differentiator 3 picks up points of changes in the signal B, that is, a start point and a finish point in the abnormal discharge, and it outputs a signal C. A memory and computing means 8 discriminates species of the abnormal discharge in accordance with respective data obtained by a signal processing means and it stores four data of hour, time, peak voltage, and species, and these data are displayed on a display means 9, as needed. When excessively abnormal voltage occurs, an alarm is raised by an alarming means 10.
申请公布号 JPS63110727(A) 申请公布日期 1988.05.16
申请号 JP19860255616 申请日期 1986.10.29
申请人 HITACHI LTD 发明人 WATANABE ETSURO;ITO FUMIKAZU
分类号 H01L21/66;H01L21/302 主分类号 H01L21/66
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