| 摘要 |
PURPOSE:To eliminate the possibility of contamination in detecting elements even when they are formed by applying such a technique as a semiconductor planar process and thereby to obtain a force detecting device of high reliability, by covering with a housing a detecting surface of a flat-plate-shaped strain generating formed of a single-crystal substrate, one surface of which is made to be the detecting surface provided with the detecting elements whose electric resistance is changed by a mechanical change in the shape, and the other surface of which is made to be an operating surface provided with a force transmitting body. CONSTITUTION:A strain generating is formed of a silicon single-crystal substrate and shaped in a square, and the outer periphery side thereof is buried in a housing 2 to be a supporting part 3, while a force transmitting body 4 is joined to the center thereof to form an operating part 5. The surface having the force transmitting body 4 joined is made to be an operating surface 6, while the reverse surface is made to be a detecting surface 7, on which twelve detecting elements 8 are formed by using a silicon planar process technique. Since the detecting surface 7 of this flat-plate-shaped strain generating body 1 is covered with the housing 2, the detecting elements are prevented from contamination, and thus reliability can be increased.
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