| 摘要 |
PURPOSE:A gas separation membrane excellent in selectivity, obtained by plasma polymerizing a silicon-containing acetylene compound having a specific composition. CONSTITUTION:In forming a gas separation membrane excellent in selectivity on the surface of a substrate having fine pores comprising a high-molecular compound such as polypropylene, polystyrene or cellulose acetate, glass, ceramics or a metal, a silicon-containing acetylene compound shown by formula ( I ) or (II) (wherein R is an alkyl group, vinyl group, an aryl group or a phenyl group, R' is a hydrogen atom, an alkyl group, a vinyl group, an aryl group or a phenyl group and R and R' may be the same or different to each other, for example, bis-trimethylsilylacetylene or 1,3-diethyl-1,1,3,3-tetramethyldisiloxane is introduced into a reactor in a low pressure gaseous state and subjected to plasma polymerization to form an extremely thin gas separation membrane excellent in selectivity on the surface of the substrate in the reactor. |
