发明名称 EVALUATING METHOD FOR THIN FILM MATERIAL
摘要 <p>PURPOSE:To obtain the thermal change of a thin film material with out contact by returning reflected or transmitted light when light is made incident on the surface of the thin film material to an optical sensor through a solid medium. CONSTITUTION:The thin film sample 3 of an optical disk material is installed on a heater 2. While the heater raises the temperature at a constant speed, the light from the light source is guided to right above the sample through an optical fiber 6, incident on the sample, and reflected by the surface to return to the optical fiber 6. Further, the light is transmitted to return to an optical fiber 8. The quantity of the returning light is used as a function of temperature to perform data processing based on an optical sensor voltage. Consequently, the dynamic phase shift behavior of the optical disk material is grasped speedily with high accuracy and the performance of the material is evaluated.</p>
申请公布号 JPS63111444(A) 申请公布日期 1988.05.16
申请号 JP19860255683 申请日期 1986.10.29
申请人 HITACHI LTD 发明人 MAEDA YOSHIHIRA;MINEMURA TETSUO;ANDO HISASHI;NAGAI SHOICHI;SHIMIZU SEIKI;KANEKO TOSHITERU;WATANABE RYUJI;IKUTA ISAO;KATO YOSHIMI;KONNO KIYOSHI
分类号 G01M11/00;G01N21/55;G01N21/59;G01N21/84;G11B7/26 主分类号 G01M11/00
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