发明名称 EXPOSURE ILLUMINATING SYSTEM
摘要 PURPOSE:To enable the printing of a fine pattern with high resolution, by installing a light quantity controlling device in the midst of a laser beam path and controlling the quantity of light every pulse. CONSTITUTION:The quantity of light of laser pulses is increased by a light quantity controlling device 2 as sensitivity of a sensitizer is decreased during a time of exposure. When the quantity of light is controlled, data on decreases in sensitivity of the sensitizer for a cumulative time of exposure are investigated in advance and the light quantity controlling device 2 is operated by the use of these data. Therefore, changing the sensitizer allows the method for control to be changed. For example, when exposure by plural pulses is performed in an exposure illuminating system 3 while intensity of light is kept constant, patterns of printing are subject to the great effect of speckles depending on directivity of several initial pulses. Then, the time of a change in a concentration of non-reaction sensitivity is changed so as to be linear to the time of light irradiation, and each pulse's contribution to the light reaction is uniformalized. Hence, a fine pattern can be highly resolved.
申请公布号 JPS63110722(A) 申请公布日期 1988.05.16
申请号 JP19860255624 申请日期 1986.10.29
申请人 HITACHI LTD 发明人 YOSHITAKE YASUHIRO;OSHIDA YOSHITADA;SHIBA MASATAKA;NAKAJIMA NAOTO
分类号 H01L21/30;G03F7/20;H01L21/027;H01S3/101;H01S3/106 主分类号 H01L21/30
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