| 摘要 |
PURPOSE:To prevent exfoliation of a thin film at the time of polishing a magnetic gap forming surface by forming a point to be stuck with a high saturation magnetic flux density material to a rough surface having the difference in height larger than the lowest recording wavelength. CONSTITUTION:The part which is positioned on an upper corner part of a butt surface and where a magnetic gap is intended to be formed is etched with phosphoric acid to form the waveform-shaped rough surface (s) having the amplitude (a) larger than the lowest recording wavelength lambdae. The other part is finished by polishing to a specular surface. The thin 'SENDUST(R)' film which is composed of 85%, 9.6% and 5.4% Fe, Si and Al and has about 10,000Gauss saturation magnetic flux density is stuck by sputtering on the rough surface (s) to >=5mum thickness. An SiO2 film 23 to serve as a spacer for the magnetic gap is further laminated and formed thereon to about 1,000Angstrom .
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