| 摘要 |
PURPOSE:To form a thin film of target substance which is homogeneous and has uniform thickness on a circular base plate at high velocity by making a permanent magnet provided on the rear surface of the target to the specified shape and also making it rotatable in a magnetron sputtering device. CONSTITUTION:In the inside of a vacuum tank 2, a circular base plate 8 is fitted to an anode 6 and also a discoid target 10 is similarly arranged as a cathode to the opposite position and a rotary table 20 rotated with a motor 18 is provided on the rear surface of the target 10. A permanent magnet 16 is provided on the rotary table 20 so that one magnetic pole 22 is positioned on the central position of the rotary table 20 and the other magnetic pole 24 is made to a magnet having a circular arc-like shape reaching the outer peripheral edge part of the rotary table 20. Gaseous Ar is introduced into the vacuum tank 2 and DC high voltage is impressed between the target 10 as the cathode and the anode 6 to discharge plasma and a thin film is formed on the base plate 8 by ionizing Ar and sputtering the target 10. In this case, since the permanent magnet 16 is rotated together with the rotary table 20, the thin film of the target substance which is homogeneous and has uniform thickness can be formed on the base plate 8.
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