| 摘要 |
PURPOSE:To provide the protecting film of a thermal head with acid and crack resistances in addition to wear resistance, thereby prolonging its use-life, by constituting the protecting film by silicon which contains a specific atomic percent nitrogen. CONSTITUTION:Silicon which is employed as the protecting film of a thermal head has excellent wear resistance but is somewhat inferior in acid and crack resistances. If silicon is allowed to contain about 5-40atom% nitrogen, the acid and crack resistances are improved without deteriorating the wear resistance. Accordingly, the life of the thermal head is prolonged. It is to be noted that a nitrogen content less than about 5% does not show great effect, while a nitrogen content in excess of 40% rather deteriorates the acid and crack resistances. |
