| 摘要 |
A method of measuring non-linearity of a pattern edge of a pattern formed on a metal plate such as a glass plate and an apparatus for measuring the same are disclosed. With this novel pattern edge measurement system, first is to dispose a pattern to be measured so that a photosensitive picture element column in a light-receiving unit is substantially in parallel with a pattern edge of an image of the pattern to effect a relative movement of the light-receiving unit or the image of the pattern so that light-receiving unit traverses the pattern edge. Next is to memorize a signal indicative of a light received by the photosensitive picture element column every predetermined moving distances of the light-receiving unit or the pattern to determine a pattern edge position per each photosensitive picture element by making use of the received light signal. Then, a non-linearity of the pattern is computed on the basis of each pattern edge position. Thus, the novel pattern edge measuring system makes it possible to quantitatively measure a non-linearity of a pattern edge with high precision.
|
