发明名称 FORMATION OF ALPHA-RAY CUTOFF FILM
摘要 PURPOSE:To realize the formation of an alpha-ray cutoff film by a method wherein, after the surface of a chip is coated with a coating solution, a film is formed on the surface of the solution. CONSTITUTION:The surface of a chip 1 is coated with a coating solution 2 a little; this solution is dried by a blast of hot air; a film 3 is formed on the surface of the coating solution. The remaining part of the coating solution 2 is injected into the film 3 by means of a jig 4. During this injection process the coating solution 2 remains inside the film 3; it is possible to prevent that the solution flows out from the surface of the chip 1 to its circumference. If the surface of the film 3 is coated again with the coating solution 2, it is possible to prevent a defect that the solution flows out from the surface of the chip 1. With this constitution, it is possible to form a film to cut off alpha-rays on the surface of the chip in a stable manner.
申请公布号 JPS63104427(A) 申请公布日期 1988.05.09
申请号 JP19860249650 申请日期 1986.10.22
申请人 HITACHI LTD 发明人 MIWA TAKASHI;TSUTSUMI YASUMI;HONDA ATSUSHI
分类号 H01L21/312 主分类号 H01L21/312
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