| 摘要 |
PURPOSE:To prevent a defect due to the corrosion of a wiring part or the like by forming a barrier metal film in the neighborbood of a contact hole only. CONSTITUTION:A contact hole 26 is made on an insulating film 15; contact holes 17-19, 27 are made on insulating films 15 and 16. A barrier metal film 20 such as, e.g., a TiW film is formed in the neighborhood of the contact holes. By means of this barrier metal film 20, it is possible to effectively prevent an alloying reaction of a base-extraction electrode 13 and a polycrystalline silicon resistor R with a wiring part 21 and to prevent another alloying reaction of the polycrystalline silicon resistor R with a wiring part 22. In addition, there occurs no effect of a local battery, which is caused by the phenomenon that an edge of a two-layer film composed of an aluminum wiring part and the barrier metal film is exposed to a contact hole 25a. As a result, it is possible to prevent the breakage of the wiring part 22 or the like due to the corrosion.
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