| 摘要 |
PURPOSE:To enable to automatically perform a mounting, dismounting or replacement of a mask by a method wherein the mask is positioned on a mask supporting part using a stopper and a roller, and a wafer is conveyed there in a rotating manner using a prealignment mechanism, thereby enabling to perform the handling of the mask and the wafer independently. CONSTITUTION:The mask 11 is positioned on the mask supporting part 10, which constitutes the mask alignment mechanism, using the stopper 60, rollers 61 and 62 located on the outer circumference, and a semiconductor wafer 3 is placed on the mask 11. A wafer loader mechanism 4 is provided on one side of said mechanism 1, the wafer 3 located in a cartridge 7 is attracted by an attracting part 9 using the arm 8 which constitutes a prealignment mechanism 2, and the wafer 3 is shifted to the mask 11 by rotating the arm 8. Also, an unloader mechanism 5 with which the photosensitized wafer 3 will be carried out is provided on the other side of the mechanism 1, and the wafer 3 is placed in a cartridge 12. Besides, a mask loader-unloader mechanism 6 is provided opposing to the mechanism 5, and the mask 11 is positioned on the supporting part 10 using a cylindrical mechanism 92. |
