PRODUCTION OF SUBSTRATE WITH TRANSPARENT ELECTRODE

摘要

PURPOSE:To produce a substrate with transparent electrodes by sticking a translucent film to the surface of a transparent glass plate with a sintered In2O3 body contg. SnO2 as a target, then removing the unnecessary parts of the translucent film in the atm., and heat treating the substrate. CONSTITUTION:The transparent glass substrate 13 and the target 3 consisting of the sintered In2O3 body contg. 3-15wt% SnO2 are disposed in a vacuum vessel 1 of a magnetron sputtering device S. Gaseous Ar contg. 0.2-3.0vol% O2 is supplied from a supply pipe 5 into the vacuum vessel 1 in such a manner that 5X10<-4>-5X10<-3>Torr atmospheric pressure is maintained therein. The glass substrate 13 is heated to <=100 deg.C by a heater 12 and a negative voltage is impressed to the target 3 to sputter the target by the ionized gaseous Ar, by which the translucent film is formed on the substrate 13. The substrate is taken out into the atm. and is etched with a dilute acidic soln. by using a masking material to remove the unnecessary parts of the opaque film, by which the glass substrate with the translucent film of a desired pattern is obtd. The substrate is heated in an N2 atmosphere to clarify the translucent film. The glass substrate with the transparent electrodes is thus produced.