发明名称 VACUUM VALVE FOR METAL VAPOR DEPOSITION DEVICE
摘要 PURPOSE:To permit reduction in the size over the entire part of a metal vapor deposition device and to reduce the production cost of the device by mounting a vacuum valve having specific construction consisting of metallic sheets to the partition wall between the prevacuum chamber and vapor deposition chamber of the metal vapor deposition device. CONSTITUTION:An aperture 4a is provided to the partition wall 4 between the prevacuum chamber 2 and vapor deposition chamber 3 of the metal vapor deposition device which deposits Al, Ti, etc. by evaporation on a substrate by the metal vapor generated from a molten metal of Al, Ti, etc. The vacuum valve 1 formed by superposing two metallic sheets, integrally welding both side edges, forming one end as a free end having deflection at the center and welding the other end to the periphery of the aperture 4a of the above-mentioned partition wall 4 is mounted into said aperture 4a. A level 1c for actuating said vacuum valve 1 is connected to the metallic sheet 1a of the valve 1. The valve is opened if said sheet is pulled apart from the other metallic sheet 1b by operating the lever 1c from the outside. The metallic sheet 1a restores the tight contact with 1b to the original shape to close the aperture 4a when the level 1c is pushed down. The substrate for vapor deposition is easily put into and out between the prevacuum chamber 2 and the vapor deposition 3 through the valve 1 by such opening and closing.
申请公布号 JPS63103063(A) 申请公布日期 1988.05.07
申请号 JP19860247373 申请日期 1986.10.20
申请人 NKK CORP 发明人 KANEKO FUMITAKA
分类号 C23C14/24;C23C14/56 主分类号 C23C14/24
代理机构 代理人
主权项
地址