| 摘要 |
<p>PURPOSE:To obtain the title polymer excellent in oxygen plasma resistance and useful as a functional polymer material such as a light- or radiation- sensitive material, having a specified structural formula. CONSTITUTION:A trichlorosilane or trialkoxysilane containing an organic group having a phenolic hydroxyl group protected in the form of an alkoxy group, a t-butyldimethylsiloxy group, a methylene acetal or the like is obtained by, for example, a process wherein a halide (e.g., benzyl chloride derivative) is condensed with HSiCl3 in the presence of a tert. amine. The obtained compound is subjected to a treatment which varies according to the protected hydroxyl group to eliminate the protective group. In this way, the title polymer of the formula (wherein R1 is an organic group having a phenolic hydroxyl group, R2-3 are each on organic group free of a phenolic hydroxyl group, n, m and lare integers, and n/(n+m+l)>0.4), e.g., a polymer of the formula (wherein R1 is a p-hydroxyphenylethyl group, R2 is a p-methoxyphenylethyl group and R3 is a p-trimethylsiloxyphenylethyl group) can be obtained.</p> |
