| 摘要 |
PURPOSE:To prevent the deterioration in the soft magnetic characteristic of a magnetic film by forming the magnetic film by a confronting target DC sputtering method. CONSTITUTION:A recess 11 for embedding a lower magnetic core is formed by a photoetching method on a nonmagnetic substrate 1 and a nonmagnetic underlying film consisting of Cr and Zr or the like is formed thereon by sputtering to a prescribed film thickness. An amorphous Co alloy is formed on the substrate by the confronting target DC sputtering method. The atmosphere at this time is specified to 5N Ar, >=1X10<-4>Torr and 2X10<-3>Torr gaseous pressures. Unnecessary parts of the thin nonmagnetic film and magnetic core are then removed by lapping. A gap layer 4, a signal coil 52, a coil-magnetic core insulating layer 51, and an upper core 5 are laminated thereon to a prescribed shape. A protective film layer 6 is formed thereon and a protective plate 7 is adhered thereto. The magnetic characteristics of the magnetic film formed on the slopes of the recess are thereby improved and the electromagnetic conversion characteristic of the thin film magnetic head is improved.
|
