| 摘要 |
<p>A cleaning apparatus in its most preferred form of a floor polishing machine (10) having a polishing member (16) rotatably mounted to a platform (18). The polishing member (16) is raised off the floor surface by lift levers (32 and 42) and lever extensions (34 and 44) pivotally mounted to the chassis (12) having their first ends pivotally mounted to the platform (18) of the polishing member (16) and their second ends pivotally attached to a vertically reciprocal rod (68) biased by a spring (78). The polishing member (16) automatically lowers due to the suction created by the polishing member (16) forcing the air from underneath the center of the polishing member (16) during rotation and against the bias of the spring (78). The rigid polishing member (16) is allowed to follow the floor surface due to the pivotal mounting of the platform (16) to the ends of the lift levers (32 and 42) and to a parallelogram assembly (54 and 58). To control dust and debris, a vacuum chamber (84) is provided surrounding the polishing member (16), with the vacuum being created by an impeller (114) formed on and rotating with the polishing member (16) and within a pressurizing chamber (132) for drawing air out of the vacuum chamber (84) and forcing it through a filtering dust bag (148).</p> |
