发明名称 |
MULTILAYER OHMIC CONTACT FOR P-TYPE SEMICONDUCTOR AND METHOD FOR MAKING SAME |
摘要 |
<p>MULTILAYER OHMIC CONTACT FOR P-TYPE SEMICONDUCTOR AND METHOD OF MAKING SAME Novel ohmic contacts are provided for p-type semiconductor compounds comprising at least one of the metals of Class IIB of the Periodic Table of Elements and one of the non-metal elements of Class VIA of the Periodic Table of Elements, as well as a method for forming such novel ohmic contacts. These ohmic contacts comprise d multilayer metal contact wherein the first layer provides a lasting stable contact with the p-type semiconductor; the additional layers provide the necessary electrical conductivity for the contact to be efficient.</p> |
申请公布号 |
CA1236224(A) |
申请公布日期 |
1988.05.03 |
申请号 |
CA19850497874 |
申请日期 |
1985.12.17 |
申请人 |
SOHIO COMMERCIAL DEVELOPMENT COMPANY;BP PHOTOVOLTAICS, LTD. |
发明人 |
BASOL, BULENT M. |
分类号 |
H01L31/04;H01L21/28;H01L21/443;H01L21/445;H01L29/43;H01L29/45;(IPC1-7):H01L23/48 |
主分类号 |
H01L31/04 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|