发明名称 MULTILAYER OHMIC CONTACT FOR P-TYPE SEMICONDUCTOR AND METHOD FOR MAKING SAME
摘要 <p>MULTILAYER OHMIC CONTACT FOR P-TYPE SEMICONDUCTOR AND METHOD OF MAKING SAME Novel ohmic contacts are provided for p-type semiconductor compounds comprising at least one of the metals of Class IIB of the Periodic Table of Elements and one of the non-metal elements of Class VIA of the Periodic Table of Elements, as well as a method for forming such novel ohmic contacts. These ohmic contacts comprise d multilayer metal contact wherein the first layer provides a lasting stable contact with the p-type semiconductor; the additional layers provide the necessary electrical conductivity for the contact to be efficient.</p>
申请公布号 CA1236224(A) 申请公布日期 1988.05.03
申请号 CA19850497874 申请日期 1985.12.17
申请人 SOHIO COMMERCIAL DEVELOPMENT COMPANY;BP PHOTOVOLTAICS, LTD. 发明人 BASOL, BULENT M.
分类号 H01L31/04;H01L21/28;H01L21/443;H01L21/445;H01L29/43;H01L29/45;(IPC1-7):H01L23/48 主分类号 H01L31/04
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