发明名称 |
Thermally processable element comprising an overcoat layer containing poly(silicic acid) |
摘要 |
A overcoat layer comprising poly(silicic acid) <IMAGE> on a thermally processable element enables reduced release of volatile components from the element during thermal processing. The overcoat layer also can optionally comprise other water soluble polymers. A developed visible image is provided in an exposed silver halide photothermographic element comprising such an overcoat by uniformly heating the photothermographic element to moderately elevated temperatures without release of volatile components. The described overcoat is also useful on thermographic elements.
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申请公布号 |
US4741992(A) |
申请公布日期 |
1988.05.03 |
申请号 |
US19860910033 |
申请日期 |
1986.09.22 |
申请人 |
EASTMAN KODAK COMPANY |
发明人 |
PRZEZDZIECKI, WOJCIECH M. |
分类号 |
G03C1/498;G03C1/76;(IPC1-7):G03C1/76 |
主分类号 |
G03C1/498 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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