发明名称 High-resolution photosensitive composition which can be developed by plasma and a photolithographic method of using said composition
摘要 A high-resolution photosensitive composition which can be plasma-developed, including an acrylic polymer and a photosensitive compound, of the aromatic azide group, in which the polymer contains, in a side chain, at least one aromatic nucleus where at least one chlorine atom (Cl) has replaced at least one hydrogen atom (H) for example <IMAGE>
申请公布号 US4741986(A) 申请公布日期 1988.05.03
申请号 US19860874744 申请日期 1986.06.16
申请人 U.S. PHILIPS CORP. 发明人 COLLET, ANDRE;GOURRIER, SERGE;MAURIN, OLIVIER
分类号 G03F7/008;G03F7/012;G03F7/20;G03F7/36;(IPC1-7):G03C1/71;G03C1/68;G03C1/70 主分类号 G03F7/008
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