发明名称 |
High-resolution photosensitive composition which can be developed by plasma and a photolithographic method of using said composition |
摘要 |
A high-resolution photosensitive composition which can be plasma-developed, including an acrylic polymer and a photosensitive compound, of the aromatic azide group, in which the polymer contains, in a side chain, at least one aromatic nucleus where at least one chlorine atom (Cl) has replaced at least one hydrogen atom (H) for example <IMAGE>
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申请公布号 |
US4741986(A) |
申请公布日期 |
1988.05.03 |
申请号 |
US19860874744 |
申请日期 |
1986.06.16 |
申请人 |
U.S. PHILIPS CORP. |
发明人 |
COLLET, ANDRE;GOURRIER, SERGE;MAURIN, OLIVIER |
分类号 |
G03F7/008;G03F7/012;G03F7/20;G03F7/36;(IPC1-7):G03C1/71;G03C1/68;G03C1/70 |
主分类号 |
G03F7/008 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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