发明名称 Installation for etching material
摘要 In an installation for etching material to be etched consisting at least partly of metal, preferably copper, oxidizing agent is added to the etching medium containing an acid, directly before the actual etching operation, in a quantity which is in a ratio to the quantity required according to stoichiometric calculation for etching the quantity of metal to be removed respectively from the material to be etched. For this a device is provided which emits a first electrical signal. This gives information about the quantity of material to be removed from the material to be etched respectively being processed. A second signal is emitted by a detector when the material to be etched enters the actual etching machine. Both signals are processed by a central control unit. This takes place in such a way that the central control unit emits a third signal which it has ascertained according to a memorized program from the first signal and whenever the detector signal is received. The third signal corresponds to the respectively desired quantity of oxidizing agent and acts on a metering device which then undertakes measuring of the quantity of oxidizing agent. In the same way acid may be added to the etching medium for regeneration in a stoichiometrically defined quantity.
申请公布号 US4741798(A) 申请公布日期 1988.05.03
申请号 US19860929420 申请日期 1986.11.12
申请人 HANS HOLLMULLER MASCHINENBAU GMBH & CO 发明人 HAAS, RAINER D.
分类号 C23F1/08;H05K3/06;(IPC1-7):H01L21/306;C23F1/02 主分类号 C23F1/08
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